Titanium ( Tungsten ) sputtering targets are widely here utilized in thin-film deposition processes due to their exceptional attributes. Ti possesses a high resilience, excellent corrosion resistance, and remarkable biocompatibility. These qualities make Ti sputtering targets ideal for a variety of applications in industries such as aerospace. Com

Gold sputtering targets are essential components in various thin-film deposition processes, owing to their exceptional properties. These targets, often made of high-purity gold, are used in a sputtering system to generate an ionized plasma that deposits a thin layer of gold onto a substrate. The resulting gold films exhibit remarkable durability, m